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Student Designs Ionic Knife To Etch Transistors

Discussion in 'General Discussion' started by StormBringer, Feb 27, 2003.

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StormBringer Newcomer, in training

Very interesting read here

"Using photoresist to create transistors can be a 20- to 100-step process," Ryna Karnik explained. "Using a focused beam of heavy gallium ions to etch the transistors directly takes six to seven steps." The student researcher has applied for a patent on the system.

"If Ryna's fabrication technique proves easily reproducible, reliable and scalable, it will be a valuable tool for chip designers by allowing them more flexibility when trying to debug a prototype chip,"

Story from: http://www.techextreme.com/
Original Source: http://sci.newsfactor.com/

StormBringer, Feb 27, 2003

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