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02-27-2003, 01:32 PM
Very interesting read here (http://www.techextreme.com/perl/story/20853.html)
"Using photoresist to create transistors can be a 20- to 100-step process," Ryna Karnik explained. "Using a focused beam of heavy gallium ions to etch the transistors directly takes six to seven steps." The student researcher has applied for a patent on the system.
"If Ryna's fabrication technique proves easily reproducible, reliable and scalable, it will be a valuable tool for chip designers by allowing them more flexibility when trying to debug a prototype chip,"
Story from: http://www.techextreme.com/
Original Source: http://sci.newsfactor.com/
"Using photoresist to create transistors can be a 20- to 100-step process," Ryna Karnik explained. "Using a focused beam of heavy gallium ions to etch the transistors directly takes six to seven steps." The student researcher has applied for a patent on the system.
"If Ryna's fabrication technique proves easily reproducible, reliable and scalable, it will be a valuable tool for chip designers by allowing them more flexibility when trying to debug a prototype chip,"
Story from: http://www.techextreme.com/
Original Source: http://sci.newsfactor.com/
